Plasma and Nanofabrication Research Group
Overview of Research

Plasma processing of advanced materials and devices is central to many of the research activities within the Centre, across most research groups. The Plasmas and Nanofabrication Group aim to integrate studies of complex technological plasmas with nanomaterials processing and device fabrication, in collaboration with other groups. Through detailed plasma characterisation and new plasma system designs we aim to enhance the control and application of materials processing to advanced nanoscale device fabrication. Research focuses mainly on two technological gas chemistries, namely: chlorine-based and hydrocarbon based. 

Applications: Implantable medical devices, sensors and biosensors, bio-chips, magnetic storage, MEMS, Si and III-V fabrication.

Key Projects
Plasmas
View Plasma Diagnostics and Characterisation

Including (i) RF electrical spectroscopy for monitoring and control, (ii) substrate ionic and neutral bombardment species energy and flux characterisation, (iii) plasma species characterisation and modelling, (iv) correlation of plasma and substrate bombardment characteristics with resultant materials properties, (v) techniques for plasma in-situ materials monitoring leading ultimately to real-time processing sensors

Plasma System Design
For processing of large-scale and small-scale three dimensional substrates and ultra-thin (10nm) non-planar materials deposition.
Microplasmas
Novel microdischarge devices and operating regimes for application in medical device diagnostics and sensors
Biomaterials
Diamond-like amorphous carbon (hydrogen free) by filtered vacuum cathodic arc and unbalanced magnetron sputtering. Hydrogenated amorphous carbon (a-C:H) and polymeric films by RF planar and RF coaxial PECVD. Surface modification and nanoscale coating of implantable medical devices (e.g. cardiovascular stents) for enhanced biocompatibility.
Nanofabrication
Nanostructured surfaces for optimised or pre-determined cell and protein response. Carbon nanotubes for biomedical applications: growth and functionalisation by plasmas and low energy neutral or ion beams.
Plasma Processing for Terascale Integration
Plasma technology for high-density magnetic storage device manufacture. Chemistries for III-V materials etching Nanotubes for CMOS integration: growth, functionalisation and properties.
Collaboration
Plasma Physics, Queen's University, Belfast, Plasma Modelling, Institute of Physics, Belgrade Plasma Diagnostics, INP Greifswald, Condensed Matter Studies, National Taiwan University Atomistic Modelling, University of Sydney, University of Surrey Biomaterials, Imperial College

Industrial Partners
Seagate; Intel; Oxford Institute; Boston Scientific

For further information please contact the Group Leader: Professor Paul Maguire

E: pd.maguire@ulster.ac.uk

T: +44 (0)28 9036 8930